Precision ion polishing system for precise centering, control, and reproducibility of your milling process.
- X,Y stage permits alignment of argon beams to region of interest on the sample
- Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
- Digital optical imaging with image storage and analysis in DigitalMicrograph® software
- 10" color touch screen for display and control of all PIPS™ II parameters
Fast and reliable mechanical method of pre-thinning to near electron transparency to greatly reduce your ion milling times and uneven thinning.
Cut your brittle materials beyond the 3 mm transmission electron microscope (TEM) disc to accurately cut holes or unique shapes.
Advanced plasma cleaning system for removal of hydrocarbon contamination on TEM and SEM samples.